Processing of Monolayer MoS2
What is Molybdenum disulfide?
Molybdenum disulfide belongs to a class of materials called 'transition metal dichalcogenides' (TMDCs). Materials in this class have the chemical formula MX2, where M is a transition metal atom (groups 4-12 in the periodic table), and X is a chalcogen (group 16). The chemical formula of molybdenum disulfide is MoS2. The crystal structure of molybdenum disulfide (MoS2) forms a hexagonal plane of S atoms on either side of a hexagonal plane of Mo atoms. These triple planes stack on each other, with strong covalent bonds between the Mo and S atoms but weak van der Waals forces holding layers together. This allows them to be mechanically separated to form 2-dimensional sheets of MoS2. Following the huge research interest in graphene, MoS2 was the next 2-dimensional material to be investigated for potential device applications. Due to its direct bandgap, it has a great advantage over graphene for several applications, including optical sensors and field-effect transistors.
Applications of Monolayer MoS2
Supercapacitor electrodes: The most common crystal structure of MoS2 (2H) is semiconducting, which limits its viability for use as an electrode. However, it can also form a 1T crystal structure which is 107 more conductive than the 2H structure. Stacked 1T monolayers acting as electrodes in various electrolytic cells showed higher power and energy densities than graphene-based electrodes. Valleytronic devices: While still a technology in its infancy, there have been some early demonstrations of devices that operate on the principles of Valleytronics. Examples include a bi-layer MoS2 transistor with gate-tunable valley Hall effect and valley polarised light emitting devices.
Processing of Monolayer MoS2
Vapor deposition: While mechanical exfoliation can provide highly crystalline monolayers, it is not scalable. If 2D materials are to find application in optoelectronics, a reliable large-scale method for producing high-quality films is needed. One such potential method that has been extensively studied is vapor deposition. Chemical vapor deposition involves a chemical reaction to convert a precursor to the final MoS2. Commonly, MoO3 is annealed at high temperatures (~1000°C) in the presence of sulfur to produce MoS2 films. Other precursors include molybdenum metal and ammonium thiomolybdate, which were deposited via e-beam evaporation and dip-coating before being converted into a furnace. FETs fabricated from vapor-grown films display far lower mobility than those produced from exfoliated layers. Furthermore, the size (generally 10's nm to a few microns), thickness, quality of the films, and substrate choice. A promising alternative route to MoS2 monolayer growth is physical vapor deposition, where MoS2 powder is used directly as the source. This can yield high-quality monolayer flakes (up to 25 microns), displaying optical properties commensurate with exfoliated layers.
Price of Molybdenum disulfide
Molybdenum disulfide particle size and purity will affect the product's Price, and the purchase volume can also affect the cost of Molybdenum disulfide. A large amount of large amount will be lower. The Price of Molybdenum disulfide is on our company's official website.
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