In the precision machinery and optical industries, many situations require products to have a "glossy" surface. The purpose of this is not only for aesthetics, but more often for production and use requirements. In order to achieve this goal, it is necessary to use physical mechanical or chemical means to reduce the surface roughness of the object. This process is called "polishing".
In the polishing process, it is indispensable to wear fine abrasive particles on the surface of the object being polished at high speed to make it smooth. They are generally called "polishing powder". Polishing powder usually includes aluminum oxide, silicon oxide, zirconium oxide, cerium oxide and other components. Different materials have different hardness and chemical properties in water, so the use occasions are also different.
Among them, SiO2 polishing powder has good luminous effect, but the cutting rate is low; diamond or SiC has high hardness, fast cutting rate, but there are scratches on the surface; and alumina polishing powder has moderate hardness, fast cutting rate, good luminous effect, and simple production process , Low cost and other advantages, so it has been reused to a considerable extent in the fields of machine preparation, optical processing, jewelry processing, automobile repair and maintenance, and has brought huge economic and social benefits to our country.
Classification of alumina polishing powder
The main component of alumina polishing powder is α-Al2O3, and in order to improve the polishing effect, a dispersant is usually added in the synthetic preparation process, in addition to auxiliary components such as suspending agent, lubricant, and emulsifier.
The structure and morphology of alumina micropowder varies depending on the application. For alumina used in chemical mechanical polishing, the currently commonly used powder morphology is mainly spherical and flake. The main reasons are:
1. When the alumina used in the slurry is spherical (especially ultrafine powder), the removal rate is high, the polishing speed is fast, the polished surface is not easy to produce fine scratches, and the smoothness is high. It can be used for semiconductor single crystals, quartz crystals and precision Processing of high-precision products such as optical devices.
2. When flake alumina is used in the slurry, due to its good dispersion stability and parallel alignment, the upper and lower surfaces of the flake alumina can be basically parallel to the surface of the material to be polished, avoiding it to the greatest extent The damage under the surface of the material is reduced, and the polished surface is smooth as a mirror, which can be used for the polishing of ceramics and the polishing of glass surfaces such as optical microscopes.
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