Quartz crucibles_Leading local media on chemical materials, nano-ma

For quartz crucibles used in Czochralski technology, a 3 nm thick inner layer of quartz crucible is fabricated by fusing and coating synthetic quartz powder instantaneously on the inner surface of a quartz crucible formed of natural quartz through the arc plasma process. Since the inner layer is in direct contact with molten poly-Si at a high temperature of ~1500 °C during the growth process, the purity level of the synthetic quartz powder is required to be more than 99.9999% (6 nines, 6 N). In

Quartz crucibles used in Czochralski technology

For quartz crucibles used in Czochralski technology, a 3 nm thick inner layer of quartz crucible is fabricated by fusing and coating synthetic quartz powder instantaneously on the inner surface of a quartz crucible formed of natural quartz through the arc plasma process. Since the inner layer is in direct contact with molten poly-Si at a high temperature of ~1500 °C during the growth process, the purity level of the synthetic quartz powder is required to be more than 99.9999% (6 nines, 6 N). In

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