SiO2 is an amorphous material used in microsystems
Silicon dioxide, SiO2, is an amorphous material used in microsystems as a dielectric in capacitors and transistors, insulator to isolate various electronic elements, and structural or sacrificial layer in many micromachining processes. Thin oxide films are quickly grown or deposited on silicon wafers using different techniques reviewed in Section 2.3. High-quality oxide films provide excellent electrical insulation with resistivity values as high as 1010 Ω-m. Oxide films are also good thermal in