With the rapid development of ultra-large scale integrated circuits (ULSI), the size of equipment and devices is getting smaller and smaller, and people's requirements for device size and film quality and thickness uniformity are also increasing.…
Titanium silicide is widely used in the manufacture of a metal oxide semiconductor (MOS), metal oxide semiconductor field-effect transistor (MOSFET) and dynamic random access memory (DRAM) gate, source/drain, interconnection, and ohmic contact.…
From April the French government will reduce fuel taxes slightly to ease the burden on consumers. Warned of possible energy shortages in France by the end of the year and called on the French to conserve electricity and gas from now on, saying that i…
A wave of layoffs that has swept the entire Internet industry has intensified. China's Internet industry has experienced several crises and major changes in the past development process. There is also a "brief history of layoffs by major Internet com…
With the development of the epidemic, the price of semiconductors is likely to rise, and the price of titanium silicide, which is an important material for semiconductor components, will also be affected.…
Silicon dioxide has important uses in daily life, production, and scientific research, but sometimes it can cause harm to the human body. TSilicon dioxide dust is extremely fine, with a specific surface area of more than 100m2/g that can be suspended...…
Copper (II) oxide reacts with sulfuric acid to create water and copper (II) sulfate. This reaction could be classified as a double displacement or neutralization reaction. Copper oxide nanoparticles are highly toxic: a comparison between metal oxide ...…
Silicon nitride. A cleaner alternative is spark plasma sintering, where heating is conducted rapidly (seconds) by passing pulses of electric current through the compacted powder. Dense silicon nitride compacts have been obtained by this technique at ...…
0086-0379-64280201
brad@ihpa.net
skype
whatsapp