Tungsten silicide (also known as tungsten diilicide) is an organic silicide. Tungsten Silicide is dark gray powder. Tungsten Silicide is used in the manufacture of anti-oxidation and resistance wire compressed. Purity: 99%
Particle Size : 5-10um
About Tungsten Silicide WSi2 Powder
Tungsten silicide (WSi2)
A silicide is an inorganic compound made of tungsten. It is a ceramic conductive material.
Fluorine, halogens, strong acids and oxidants all react violently.
The coating is effective as an antioxidation coating. Similar to Molybdenum Disilicide MoSi2, its high emissivity makes it a good coating for applications.
The material’s ability to radiate heat at high temperatures makes it attractive as a heat-shield.
Microelectronics uses it as a material for contact, forming 1000degC. It is often used as a shunt to increase the signal speed and conductivity of polysilicon cables. By using monosilane (or dichlorosilane) and tungsten Hexafluoride, the silicide can be prepared through chemical vapor deposit. The film is not stoichiometric, and it requires annealing in order to become stoichiometric.
This is an alternative to the early tungsten-based film.
Tungsten silicide powder
can also be used in microelectromechanical systems and oxidation-resistant coatings.
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Characteristics of Tungsten Silicate Powder WSi2:
Tungsten Silicide WSi2 Powder (CAS 12039-82-0) has a melting point of 900°C, excellent electrical conductivity, high resistance to corrosion, high resistance to oxidation, and good electrical resistance.
A binary alloy system is the intermediate phase. It has high-temperature ductility as well as conductivity.
Technical Parameters of Tungsten Silicate WSi2 powder:
Chemical Composition Tungsten Silicate WSi2 powder:
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How is Tungsten silicide WSi2 powder made?
Raw materials for silicide tungsten are tungsten powder and silicon. They are averaged at 24 hours in acetone. Thermal measurements are made using the starting powder, which is a 5: 1 ratio. Acetone evaporation, dry substances. The mixture was heated at temperatures between 1250 and 1400 degrees C, at 50 degrees C. The heating rate was 10k * min-1. The mixture was placed into a tube-furnace and the heat treatment was performed in an argon stream for four hours. After the heat-treatment is complete, the furnace must be cooled until it reaches room temperature.
Tungsten silicide WSi2 powder
Tungsten WSi2 powder can be used in microelectronics for electric shock materials, shunting of polysilicon cables, anti-oxidation and resistance wire coating. Tungsten Silicide is a microelectronic contact material with a resistivity between 60 and 80mOcm. It is formed by heating it to 1000degC. It is commonly used as a shunt to increase the signal speed and conductivity of polysilicon. The tungsten-silicide layer can also be made by chemical vapor deposit, for example vapor. As raw materials, use monosilane (or dichlorosilane) and tungsten Hexafluoride. The deposited film has a non-stoichiometric composition and must be annealed to change into a more conductive stoichiometric structure.
Tungsten film can be replaced by tungsten silicide. Tungsten Silicide is used to create a barrier between silicon and metals.
Tungsten silicide is also very valuable in micro-electromechanical systems, in which tungsten silicide is mainly used as a thin film for the manufacture of microcircuits. A film of silicide or tungsten can be plasma-etched for this purpose.
Packing & Shipping Tungsten Silicate WSi2 Powder
The quantity of tungsten silicide WSi2 in the powder determines which packing we use.
Tungsten silicide WSi2 powder packing:
As per your request, vacuum packaging is available in 1kg bags, 25kg barrels, or at your request.
Tungsten silicide WSi2 powder shipping:
Upon receipt of payment, goods can be sent by sea or air as soon as possible.
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|tungsten disilicide, WSi2 powder
|Gray Black Powder
Solubility In H2O