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Gelation process in the formation of quartz powder

we develop a novel fumed silica-based sol–gel process for synthesizing ultra-high-purity quartz powder to achieve the requirements of semiconductor technology with a design rule of 3 nm, i.e., a metal impurity level of less than 100 ppb and median size distribution (d50) of the powder of about 150–200 μmm. In particular, the optimal process conditions for preparing potassium silicate solution, gelation time, and cleaning process of the as-synthesized quartz powder were determined by analyzing the characteristics of the as-synthesized quartz powder. In addition, we investigated how the characteristics of potassium silicate solution are affected by the relative concentration ratio of fumed silica and KOH. Furthermore, we investigated the effect of gelation time and gel-pulverizing process on the morphology and characteristics of as-synthesized quartz powder by studying the gelation process's mechanism in forming quartz powder. Moreover, the effect of hydrochloric acid (HCl) cleaning on reducing the metal impurity of the synthesized quartz powder was investigated. If you are looking for high quality, high purity, and cost-effective Quartz powder, or if you require the latest price of Quartz powder, please feel free to email contact mis-asia.

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