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Metal Alloy High Purity Titanium Sputtering Target

Titanium Sputtering targets are used frequently in flat display coatings, hardware tool coatings, decorative coatings, semiconductor components and for semiconductor components. This is the main material for making integrated circuits.

High Purity Titanium Suttering Target for Metal Alloy:

Standard:

ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:

Titanium sputtering targets are made from titanium metal. This is a strong and lightweight material that is well-respected for its strength-to-weight ratio. Titanium metal, a heavy metal that has low density is very ductile. This is especially true in an oxygen-free atmosphere. Because it has a high melting temperature (more than 1,650 degrees Celsius or 3,000 degrees Fahrenheit), this metal is useful for refractory purposes. Paramagnetic with low thermal conductivity and electrical power,

Application:

This is primarily used to display flat panels, flat panel displays and integrated circuits.

Payments & Transport:


Steel Alloy High Purity Ti Titanium Sputtering Target Property


Other Titles
The Titanium sputtering goal

N/A

Compound Formula
Ti

Molecular Weight
N/A

Appearance
N/A

Melting Point
N/A

Solubility In Water
N/A

Density
N/A

Purity
99.6%

Size
Individualized

Boling Point
N/A

Specific Heat
N/A

Thermo Conductivity
N/A

Thermal Expansion
N/A

Young’s Module
N/A

Exact Text
N/A

Monoisotopic
N/A


Steel Alloy Titanium Sputtering High Purity Target Health & Safety Information


Safety Notice
N/A

Hazard Statements
N/A

Flashing Point
N/A

Hazard Codes
N/A

Risk Codes
N/A

Safety statements
N/A

RTECS #
N/A

Transport Information
N/A

Germany
N/A




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